发明名称 SEMICONDUCTOR MANUFACTURING PROCESS MANAGEMENT SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing process management system capable of preventing a decrease in rate of operation of photo process facilities and an increase in the working hours of workers. <P>SOLUTION: The semiconductor manufacturing process management system has: a host computer 2; a cell computer 3a; and a conveyance management computer 4. A control information generation means 10 of the host computer 2 selects lots based on lot information data and device information data stored in a storage means 9, compares processing condition data of the lot information data of the lot concerned with the reticle state data and reticle current position data of reticle information data, extracts device information data of a device that can be received, selects an optimum device, and generates control information data to transmit it to the cell computer 3a. A reticle dust inspection control means 14 of the cell computer 3a generates reticle dust inspection instruction data from the selected device name and reticle name of the control information data, and instructs the photo process facilities 5a to perform inspection of the reticle dust before lots are carried into the photo process facilities 5a. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010010355(A) 申请公布日期 2010.01.14
申请号 JP20080167365 申请日期 2008.06.26
申请人 SHARP CORP 发明人 MIYAMASA TOMOAKI
分类号 H01L21/027;H01L21/02 主分类号 H01L21/027
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