发明名称 Planar Metal-Insulator-Metal Circuit Element and Method for Planar Integration of Same
摘要 A complementary metal-oxide-semiconductor (CMOS) static random-access-memory (SRAM) element comprising a planar metal-insulator-metal (MIM) capacitor is disclosed, and the planar MIM capacitor is electrically connected to the transistors in the CMOS memory element to reduce the effects of charged particle radiation on the CMOS memory element. Methods for immunizing a CMOS SRAM element to the effects of charged particle radiation are also disclosed, along with methods for manufacturing CMOS SRAM including planar MIM capacitors as integrated circuits.
申请公布号 US2010006912(A1) 申请公布日期 2010.01.14
申请号 US20090368900 申请日期 2009.02.10
申请人 HONEYWELL INTERNATIONAL INC. 发明人 LARSEN BRADLEY J.;RANDAZZO TODD A.;YUE CHEISAN
分类号 H01L29/68;H01L21/02;H01L23/52 主分类号 H01L29/68
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