发明名称 |
MICROSTRUCTURE, AND METHOD FOR PRODUCTION THEREOF |
摘要 |
<p>Disclosed is a microstructure which has excellent long-term stability and can be bonded readily and at high bonding strength by thermocompression bonding. The microstructure comprises an insulating base material which has penetrating micropores each having a pore diameter of 10 to 500 nm at a density of 1 × 106 to 1 × 1010 pores/mm2. In the inside of each of the penetrating micropores, a metal is filled at a filling rate of 30% or more. On at least one surface of the insulating base material, a layer comprising a polymer is arranged.</p> |
申请公布号 |
WO2010004981(A1) |
申请公布日期 |
2010.01.14 |
申请号 |
WO2009JP62350 |
申请日期 |
2009.07.07 |
申请人 |
FUJIFILM CORPORATION;HATANAKA YUSUKE;SUZUKI SHINYA |
发明人 |
HATANAKA YUSUKE;SUZUKI SHINYA |
分类号 |
H01B5/16;H01B13/00;H01L21/60;H01R11/01;H05K1/14 |
主分类号 |
H01B5/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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