发明名称 MICROSTRUCTURE, AND METHOD FOR PRODUCTION THEREOF
摘要 <p>Disclosed is a microstructure which has excellent long-term stability and can be bonded readily and at high bonding strength by thermocompression bonding.  The microstructure comprises an insulating base material which has penetrating micropores each having a pore diameter of 10 to 500 nm at a density of 1 × 106 to 1 × 1010 pores/mm2.  In the inside of each of the penetrating micropores, a metal is filled at a filling rate of 30% or more.  On at least one surface of the insulating base material, a layer comprising a polymer is arranged.</p>
申请公布号 WO2010004981(A1) 申请公布日期 2010.01.14
申请号 WO2009JP62350 申请日期 2009.07.07
申请人 FUJIFILM CORPORATION;HATANAKA YUSUKE;SUZUKI SHINYA 发明人 HATANAKA YUSUKE;SUZUKI SHINYA
分类号 H01B5/16;H01B13/00;H01L21/60;H01R11/01;H05K1/14 主分类号 H01B5/16
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