发明名称 DEVICE FOR DETECTING FACE POSITION, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To highly precisely detect a face position of a tested face without being affected by fluctuation of an optical member. <P>SOLUTION: A device includes: light supply optical systems (4 to 9) guiding a first measuring beam from a first pattern and a second measuring beam from a second pattern to the tested face (Wa) and projecting an intermediate image of the first pattern and an intermediate image of the second pattern; light receiving optical systems (29 to 24) guiding the first measuring beam and the second measuring beam, which are reflected by the tested face, to a first observing face (23a) and a second observing face (23a), and forming an observation image of the first pattern and that of the second pattern; and detecting parts (23 to 21 and PR) detecting position information on the observation image of the first pattern and that of the second pattern and calculating the face position of the tested face based on respective position information. The light supply optical system makes a projection magnification of the intermediate image of the first pattern along an incident face of the first measuring beam to the tested face different from that of the intermediate image of the second pattern along an incidence face of the second measuring beam to the tested face. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010010240(A) 申请公布日期 2010.01.14
申请号 JP20080165309 申请日期 2008.06.25
申请人 NIKON CORP 发明人 HIDAKA YASUHIRO
分类号 H01L21/027;G01B11/00;G03F7/207;H01L21/68 主分类号 H01L21/027
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