发明名称 FILM FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To solve the problem that while a transition layer whose composition is not sharply changed appears in the neighborhood of the interface of a film in the case of forming a hetero-epitaxial film by forming a thin film formed of materials whose lattice constants are different from those of materials configuring the main surface of a substrate on the main surface of a substrate, this transition layer results in the deterioration of characteristics of crystal in the neighborhood of the interface of the hetero-epitaxial film. SOLUTION: A substrate is bent to a direction following one main surface of the substrate according to lattice constants of materials configuring a thin film to be formed and lattice constants of materials configuring one main surface of the substrate on which the thin film is formed. Then, the thin film is formed on one main surface of the substrate in such a state that the substrate is bent. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010010440(A) 申请公布日期 2010.01.14
申请号 JP20080168597 申请日期 2008.06.27
申请人 SUMITOMO ELECTRIC IND LTD 发明人 HASHIMOTO MAKOTO;TANABE TATSUYA
分类号 H01L21/205;H01L21/20 主分类号 H01L21/205
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