| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a dense color filter thin film system having spectral properties stable in the ambient temperature and air humidity. Ž<P>SOLUTION: In the formation of the color filter thin film system pattern on some one base material, wherein a patterned resist thin film (32) having a resist thin film surface area and an area where a resist thin film is not present is mounted by a lift-off method and next, a color filter thin film system (31) is mounted, and after that, the color filter thin film system mounted on the resist thin film surface region and the region above the resist thin film surface region is removed, the mounting of the color filter thin film system (31) is carried out by film forming using plasma at a temperature up to maximum 150°C. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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