| 发明名称 |
COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD |
| 摘要 |
A lubricant-containing composition for imprints comprising a polymerizable monomer and a photopolymerization initiator in combination or a resin component is excellent in patternability and mold releasability. The composition can form a pattern having a small line edge roughness after etching.
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| 申请公布号 |
US2010009137(A1) |
申请公布日期 |
2010.01.14 |
| 申请号 |
US20090498397 |
申请日期 |
2009.07.07 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
KODAMA KUNIHIKO |
| 分类号 |
C08K5/10;B28B7/38;B29C59/02;B32B3/10;C08K5/00;C08K5/5415 |
主分类号 |
C08K5/10 |
| 代理机构 |
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