发明名称 |
METHOD FOR DEPOSITING AN OXIDE LAYER ON ABSORBERS OF SOLAR CELLS |
摘要 |
A method for depositing at least one stable, transparent and conductive layer system on chalcopyrite solar cell absorbers. The at least one stable, transparent and conductive layer system may be formed via ionizing PVD (physical vapor deposition) technology by using either high power pulsed magnetron sputtering (HPPMS) or high power impulse magnetron sputtering (HIPIMS). |
申请公布号 |
US2010006426(A1) |
申请公布日期 |
2010.01.14 |
申请号 |
US20070443352 |
申请日期 |
2007.09.28 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWAND |
发明人 |
SITTINGER VOLKER;RUSKE FLORIAN;SZYSZKA BERND |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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