| 摘要 |
<p>PURPOSE: A reticle and a method for forming a photo resist pattern using the same are provided to prevent a bridge between patterns in forming a sensitive film pattern by including light-shield patterns with uniform interval between them. CONSTITUTION: In a reticle and a method for forming a photo resist pattern using the same, a reticle is arranged in a first direction and a second direction. The reticle comprises a plurality of light-shield pattern having the outer circumference on which a first concave surface and a second convex surface are formed alternately. A neighboring light-shield pattern(12) is opposite to the second surface having a protrusion in a first direction. A neighboring light-shield pattern is opposite to the first surface having a protrusion in a second direction.</p> |
