发明名称 IMAGE SENSOR FOR LITHOGRAPHY
摘要 <p>The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.</p>
申请公布号 EP2142961(A2) 申请公布日期 2010.01.13
申请号 EP20080741685 申请日期 2008.04.29
申请人 ASML NETHERLANDS B.V. 发明人 STAALS, FRANK;LOF, JOERI;LOOPSTRA, ERIK, ROELOF;TEL, WIM, TJIBBO;MOEST, BEARRACH
分类号 G03F7/20;G03F9/00 主分类号 G03F7/20
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