发明名称 |
SURFACE MORPHOLOGY SENSOR AND METHOD FOR MANUFACTURE THEREOF |
摘要 |
[PROBLEMS] To provide a surface morphology sensor which has an improved sensitivity while retaining high mechanical strength, and to provide a method for the manufacture of the surface morphology sensor. [MEANS FOR SOLVING PROBLEMS] A surface morphology sensor comprising: a semiconductor substrate (10); an interlayer insulating film (40) which is provided on the upper side of the semiconductor substrate (10) and has a smooth upper surface; a detection electrode film (42a) which is formed on the interlayer insulating film (40); an upper insulating film (110) which is formed on the detection electrode film (42a) and the interlayer insulatingfilm (40) and has a silicon nitride film exposed at the surface; and a protective insulating film (54) which is deposited on the upper insulating film (110) and comprises a tetrahedral amorphous carbon (ta-C) film having a window (54a) formed on the detection electrode film (42a).
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申请公布号 |
KR20100005044(A) |
申请公布日期 |
2010.01.13 |
申请号 |
KR20097019898 |
申请日期 |
2007.04.05 |
申请人 |
FUJITSU MICROELECTRONICS LIMITED |
发明人 |
YAMAGATA TAKAHIRO;NAGAI KOUICHI |
分类号 |
G01B7/28;G01B7/34;H01L21/822 |
主分类号 |
G01B7/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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