| 摘要 |
PURPOSE: A coating apparatus is provided to implement uniform gas supply with respect to a substrate format without aspect ratio of even numbers. CONSTITUTION: A coating apparatus comprises a process chamber and a gas line system(1) which supplies or discharges gas to the process chamber. The gas line system includes feed ports, discharge ports, and lines. The lines are arranged between the feed ports and the discharge ports. The lines include one or more first line sections connected to the inlet ports and three or more second line sections connected to the discharge ports.
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