| 摘要 |
A process for manufacturing a semiconductor device having a polymetal structure includes patterning a bottom electrode layer by using a sacrificial layer pattern oxidizing the side surface of the patterned bottom electrode layer, forming a sidewall oxide film on both the patterned bottom electrode layer and the sacrificial layer pattern, removing the sacrificial layer pattern, and forming a top electrode layer on the exposed bottom electrode layer and the side surface of the sidewall oxide film.
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