METAL CATALYST DOPING APPARATUS AND METHOD AND METHOD OF MANUFACTURING FLAT DISPLAY DEVICE USING THE SAME

摘要

PURPOSE: A metal catalyst doping device, a doping method, and a method for manufacturing a flat display device using the same are provided to stably perform a doping process by doping a metal catalyst by fixing a cathode and moving a substrate. CONSTITUTION: A processing chamber(PC) performs the doping of the metal catalyst on a substrate with the amorphous silicon. A cathode is fixed along a height direction of the process chamber and forms the plasma on a front surface. A housing(30) is positioned on the process chamber and includes a window. A carrier(10) moves the substrate to a longitudinal direction of the process chamber. The housing includes at least one lattice in a window. The substrate transferred to the process chamber is positioned on a first reserved part(PR1) and a second reserved part(PR2).