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发明名称
Emitter for electron-beam projection lithography system and method of manufacturing thereof
摘要
申请公布号
KR100935934(B1)
申请公布日期
2010.01.11
申请号
KR20030016288
申请日期
2003.03.15
申请人
发明人
分类号
G03F7/20;H01L21/027;H01J1/312;H01J9/02;H01J37/06;H01J37/073;H01J37/305
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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