发明名称 NEW POLYIMIDE PRECURSOR COMPOSITION, ITS USE AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide: a polyimide precursor composition and a method for producing it, which can be cured at low temperature (250&deg;C or lower) and has low viscosity despite its high concentration; a polyimide coating film, formed of the polyimide precursor composition and having good physical properties, and a method for producing it; and a photosensitive resin composition using the polyimide precursor composition and a method for producing it. <P>SOLUTION: The polyimide precursor composition comprises an imidized tetracarboxylic acid having an ether bond inside the molecule of a specific structure, and a diamine having an ether bond inside the molecule of a specific structure. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010001351(A) 申请公布日期 2010.01.07
申请号 JP20080160322 申请日期 2008.06.19
申请人 KANEKA CORP 发明人 SEKITO YOSHIHIDE
分类号 C08G73/10;C09D179/04;G03F7/037 主分类号 C08G73/10
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