| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the positioning accuracy, stability and dynamic performance of an optical element in a projection optical system. <P>SOLUTION: A lithographic apparatus includes a projection optical assembly PL for projecting a patterned beam onto a target portion of the substrate, wherein the assembly includes a plurality of movable optical elements M1-M6 and a plurality of sensor units 25 for sensing the position and/or orientation of the corresponding optical element M1-M6. The movable optical elements M1-M6 is arranged in a spaced relationship on a support frame 20, 200, wherein the support frame 20 is at least partly formed by an assembly of at least two interconnected segments 21, 22, 23 connected to one another, each of the segments movably mounts at least one of the optical elements M1-M6 and fixedly mounts at least one of the sensor units 25. <P>COPYRIGHT: (C)2010,JPO&INPIT |
