| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently expose patterns on a plurality of pattern transfer regions arranged variously on a substrate subjected to the exposure. <P>SOLUTION: An exposure unit which exposes a plate PT through patterns of masks MA and MB includes a plurality of projection optical systems PLA and PLB for projecting images of the patterns of the masks MA and MB onto a plurality of pattern transfer regions on the plate PT, a stage system for moving the masks MA, MB and the plate PT in synchronization in a scanning direction, and optical system stages 36A and 36B for controlling intervals of the projection optical systems PLA and PLB in the non-scanning direction according to the arrangement of the pattern transfer regions. <P>COPYRIGHT: (C)2010,JPO&INPIT |
