发明名称 |
METHOD FOR FORMING COPPER FILM, AND WIRING BOARD |
摘要 |
PROBLEM TO BE SOLVED: To solve a problem of a conventional method for forming a copper film that the copper film formed on a flat surface of a resin substrate or a resin layer has an insufficient adhesion strength. SOLUTION: This method for forming the copper film includes: irradiating one surface of the resin layer made from an epoxy resin with plasma while keeping the layer in a flat state; applying 1-vinylimidazole onto the surface; subsequently irradiating the surface of the resin layer with an ultraviolet ray; forming a thin copper film on the surface of the resin layer with an electroless copper-plating technique; forming the copper film with a predetermined thickness by electrolytically plating copper onto the thin copper film while using the thin copper film as a power-supplying layer; and then heat-treating the resin layer and the copper film so as to improve a peel strength between the copper film and the resin layer. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2010001543(A) |
申请公布日期 |
2010.01.07 |
申请号 |
JP20080162725 |
申请日期 |
2008.06.23 |
申请人 |
SHINKO ELECTRIC IND CO LTD |
发明人 |
HARUHARA SATOSHI;SHIMIZU YUICHIRO |
分类号 |
C23C18/20;B05D3/04;B05D3/10;B05D5/12;C23C18/16;C23C18/38;C23C28/00;H05K3/18;H05K3/38 |
主分类号 |
C23C18/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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