| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of suppressing variations in quality of pattern forming processing in forming a pattern for the same film of a substrate at a plurality of times. <P>SOLUTION: An application processing unit SC, an exposure machine 16, a development processing unit SD and an etching portion 17 repeatedly execute pattern forming processing twice or more while carrying a substrate W in this order to form a pattern at a plurality of times on the same film of the substrate W, and when pattern forming processing is executed for the same substrate W after second pattern forming processing, the application processing unit SC and the development processing unit SD which are the same ones in the first pattern forming processing carry the substrate W. In this way, the variations in quality between the pattern forming processing to be executed for the same film can be suppressed. <P>COPYRIGHT: (C)2010,JPO&INPIT |
