| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable an electronic drive distance to be made infinite, significantly improve the ignitability of plasma, and make better the circumferential directional uniformity of plasma in an induction-type plasma processing device. <P>SOLUTION: The plasma processing device supplies high-frequency current from a high-frequency power source to a radio frequency induction coil 7 formed above a vacuum treatment chamber to turn the gas supplied to the vacuum treatment chamber into plasma, thus performing plasma treatment on a test piece, wherein it divides the radio frequency induction coil 7 into n (where n is an integer) radio frequency induction coil elements 7-1 to 7-4, aligns respective divided radio frequency induction coil elements into a column on one circumference, prepares delay means 6-2 to 6-4 between the radio frequency induction coil elements 7-2 to 7-4 aligned into the column and the high-frequency power source, and supplies a high-frequency current to each of the radio frequency induction coil elements 7-2 to 7-4, the high frequency current being sequentially delayed by λ (wavelength of the high-frequency power source)/n beginning with the radio frequency induction coil element 7-1. <P>COPYRIGHT: (C)2010,JPO&INPIT |
