发明名称 |
METHOD OF FABRICATING A NANOSTRUCTURE ON A PRE-ETCHED SUBSTRATE |
摘要 |
The present invention relates to a method of fabricating a nanostructure, comprising the following steps: prestructuring a substrate (1) adapted to receive the nanostructure to form a nanorelief (2) on the substrate, the nanorelief having flanks (4) extending from a bottom (1a) of the substrate and a top face (3) extending from said flanks, and then depositing on the substrate pre-structured in this way a single layer or multilayer coating intended to form the nanostructure; and further comprising: adding to the prestructured substrate or to the coating a separation layer adapted to enable separation of the coating and the substrate by external action of mechanical, thermomechanical or vibratory type; and exerting this external action on the substrate and/or the coating to recover selectively a top portion of the coating by separating it from the top face of the nanorelief so that this top portion constitutes some or all of the nanostructure.
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申请公布号 |
US2010003421(A1) |
申请公布日期 |
2010.01.07 |
申请号 |
US20070375272 |
申请日期 |
2007.06.26 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
EBELS URSULA;DIENY BERNARD;LESTELLE DOMINIQUE;GAUTIER ERIC |
分类号 |
B05D3/14;B05D3/00;B05D3/06 |
主分类号 |
B05D3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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