发明名称 NEGATIVE RESIST, PROTRUSION FOR LIQUID CRYSTAL ALIGNMENT, PHOTOSPACER, COLOR FILTER AND LIQUID CRYSTAL DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative resist for forming a protrusion for liquid crystal alignment which hardly makes burn-in of a liquid crystal produced and excels also in heat resistance, and to provide a protrusion for liquid crystal alignment, a photospacer, a color filter and a liquid crystal display which use the negative resist. <P>SOLUTION: The negative resist includes an alkali-soluble resin having a carboxyl group, a (meth)acrylic group and a benzyl group in side chains, a polymerizable monomer containing novolac epoxy (meth)acrylate, and a photopolymerization initiator. The alkali-soluble resin is prepared, by modifying a copolymer having a segment derived from a carboxylic monofunctional unsaturated compound and a segment derived from a monomer having a benzyl group, and the content of the segment derived from the monomer, having a benzyl group in the alkali-soluble resin, is &ge;35 wt.%. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010002887(A) 申请公布日期 2010.01.07
申请号 JP20090115911 申请日期 2009.05.12
申请人 SEKISUI CHEM CO LTD 发明人 KOBAYASHI HIROSHI
分类号 G03F7/038;G02B5/20;G02F1/1335;G02F1/1337;G02F1/1339;G03F7/029 主分类号 G03F7/038
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