| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a microlens array formed by exposure using a density distributed mask, wherein the exposure efficiency in pattern exposure of a photosensitive material is improved, as well as errors in horizontal and vertical dimensions in a form of the microlens are reduced. <P>SOLUTION: The microlens array is manufactured by using a density distributed mask, in which each individual unit lens of the density distributed mask is divided by virtual concentric gradation boundary circles formed from the center of the unit lens pattern, and in each annular region of the unit lens, a rhombic light-shielding pattern having a dimension in accordance with the corresponding gradation is positioned at a grid point which is an intersection of virtual vertical and horizontal grids. <P>COPYRIGHT: (C)2010,JPO&INPIT |
