发明名称 VACUUM PROCESSING DEVICE AND GAS SUPPLY METHOD
摘要 <p>A vacuum processing device wherein a control means performs, after the completion of processing in a vacuum container by a combustible gas (Step S2), a step of closing a first valve and evacuating the container (Step S3), a step of closing a second valve after the evacuation (Step S4), and a step of opening a fifth valve and supplying an inert gas in a third container into a first supply line (Step S5), and the control means also performs, after the completion of processing in the vacuum container by the inert gas (Step S8), a step of closing a third valve and evacuating the container (Step S9), a step of closing a fourth valve after the evacuation (Step S10), and a step of opening a sixth valve and supplying an inert gas in a fourth container into a second supply line (Step S11).</p>
申请公布号 WO2010001849(A1) 申请公布日期 2010.01.07
申请号 WO2009JP61834 申请日期 2009.06.29
申请人 SHARP KABUSHIKI KAISHA;KISHIMOTO, KATSUSHI;NISHI, YUTAKA 发明人 KISHIMOTO, KATSUSHI;NISHI, YUTAKA
分类号 H01L21/205;C23C16/448;H01L21/31 主分类号 H01L21/205
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