| 摘要 |
<P>PROBLEM TO BE SOLVED: To disclose a lithography apparatus comprising a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. <P>SOLUTION: The substrate table supports a substrate. The projection system induces a patterned radiation beam to a target portion of the substrate. The liquid confinement structure confines immersion liquid at least partially to a space between the projection system and the substrate and/or substrate table, or between the both of them. The thermal measurement system includes thermosensitive coating. The thermal measurement system 100 detects a temperature of the immersion liquid contacting the coating. The thermal measurement system, metrology system having the thermal measurement system, and a dummy wafer for the thermal measurement system are also disclosed. <P>COPYRIGHT: (C)2010,JPO&INPIT |
