| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microwave plasma processing apparatus capable of preventing disorder of plasma by restraining variations of a transmission path of microwaves, and a method of supplying microwaves using the apparatus. <P>SOLUTION: The microwave plasma processing apparatus 10 excites gas by electric field energy of microwaves emitted from a radial line slot antenna 205 in order to perform plasma treatment of a substrate G. The microwave plasma processing apparatus 10 includes a processing container 100 wherein the plasma processing is performed inside, a microwave source 335 for outputting the microwave, a rectangular waveguide 305 for transmitting the microwave outputted from the microwave source, a coaxial converter 310 for changing a mode of a microwave transmitted through the rectangular waveguide, an internal conductor 315 of the coaxial waveguide sidably connected with the coaxial inverter, a first contact member 330 connected with the coaxial inverter and electrically connecting between the coaxial inverter and the internal conductor, and a first spring member 375 for absorbing displacement of the radial line slot antenna and its upper member caused by thermal expansion. <P>COPYRIGHT: (C)2010,JPO&INPIT |
