发明名称 EXCIMER LASER DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an excimer laser device capable of continuously oscillating by achieving an excitation state at uniform density in the longitudinal direction. SOLUTION: This excimer laser device 100 is provided with: a slab type carbon dioxide laser oscillator 10; a laser resonator filled with an excimer gas on an optical axis; and a cylindrical lens 11 linearly focusing laser light from the slab type carbon dioxide laser oscillator 10 to extend along the optical axis from a direction nearly orthogonal to the optical axis. The excimer gas runs in a direction nearly orthogonal to the optical axis and the laser light from the slab type carbon dioxide laser oscillator 10. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010003792(A) 申请公布日期 2010.01.07
申请号 JP20080159937 申请日期 2008.06.19
申请人 LASERTEC CORP 发明人 TAKEHISA KIWAMU
分类号 H01S3/225 主分类号 H01S3/225
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