| 摘要 |
PROBLEM TO BE SOLVED: To provide a two-stage laser device suitable for a semiconductor exposure device, having a low spatial coherence, while taking advantages such as high stability, high output efficiency, and a narrow line width of the MOPO method. SOLUTION: A two-stage laser device for exposure includes an oscillation-stage laser 50 and an amplification-stage laser 60. Oscillation laser light having divergence is used as the oscillation-stage laser. The amplification-stage laser comprises a Fabry-Perot etalon resonator composed of an input-side mirror 1 and an output-side mirror 2. The resonator is configured as a stable resonator. COPYRIGHT: (C)2010,JPO&INPIT |
