| 摘要 |
In designing a FLOTOX EEPROM of a dual cell type, a consideration should be given to the layout of cells for microminiaturization of the FLOTOX EEPROM. The FLOTOX EEPROM of the dual cell type includes two paired floating gates (25a, 25b), two tunnel windows (33a, 33b) a shared source (27), a shared control gate (26), select gates (29a, 29b), and a shared drain 28. Thus, a higher reliability design and a higher breakdown voltage design are achieved for the FLOTOX EEPROM of the dual cell type.
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