发明名称 |
METHOD FOR SELECTIVELY REMOVING ORGANIC POLLUTANT FROM AQUIFER |
摘要 |
PURPOSE: A method for removing contaminant materials selectively existing in aquifers is provided to remove the contaminant materials efficiently, and to maximize removal efficiency of the contaminant materials while maintaining the amount of the air and surfactants. CONSTITUTION: A method for removing contaminant materials selectively existing in aquifers includes the following steps of: forming a surfactant layer by adjusting the flow rate of surfactants according the quantity of subsurface water after injecting surfactant liquid to the contaminant materials to a horizontal direction; aerating aquifers by adjusting the flow rate of the air by injecting the air from the bottom of the aquifers. The surfactant is an anionic surfactant or a nonionic surfactant. |
申请公布号 |
KR20100002359(A) |
申请公布日期 |
2010.01.07 |
申请号 |
KR20080062217 |
申请日期 |
2008.06.30 |
申请人 |
INDUSTRY ACADEMIC COOPERATION FOUNDATION, HALLYM UNIVERSITY;KOREA DEVELOPMENT CO., LTD. |
发明人 |
KIM, HEON KI |
分类号 |
B09C1/08 |
主分类号 |
B09C1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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