| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily mold a molded article having an excessively large level difference compared with the thickness of a single photoresist layer. <P>SOLUTION: A molding method is disclosed, including: a first exposure step of exposing a first photoresist layer 31 by using a first mask; a second exposure step of forming a second photoresist layer 32 on the first photoresist layer 31 after exposed and exposing the second photoresist layer 32 by using a second mask; and a developing step of developing the first and the second photoresist layers 31, 32, respectively, together after exposed, to obtain a molded article 20 having a combination of a first molded portion 31b molded in the first photoresist layer 31 having a feature corresponding to the opening feature of the first mask and a second molded portion 32b in the second photoresist layer 32 having a feature corresponding to the opening feature of the second mask. <P>COPYRIGHT: (C)2010,JPO&INPIT |
