| 发明名称 |
PHOTOLITHOGRAPHY SYSTEM USING AN OPTICAL MICROSCOPE |
| 摘要 |
A photolithography system using an optical microscope is provided that can form various types of selective patterns at a low cost in small-scale research using unit-size silicon substrates which is not targeted for mass production, without requiring an expensive photomask.
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| 申请公布号 |
US2010002213(A1) |
申请公布日期 |
2010.01.07 |
| 申请号 |
US20080033264 |
申请日期 |
2008.02.19 |
| 申请人 |
KOREA UNIVERSITY INDUSTRIAL & ACADEMIC COLLABORATION FOUNDATION |
发明人 |
KIM GYU-TAE;PARK EUNG-SEOK;JANG DO-YOUNG;LEE JAE-WOO |
| 分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
| 代理机构 |
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代理人 |
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