发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To make scanning speed in scanning exposure higher. <P>SOLUTION: The projection optical system for projecting an image of a first plane (PN1) to a second plane (PN2) includes: a first imaging system (G1) including a first concave mirror (CM1) having a first optical axis (AX1) parallel with a predetermined plane (xz plane) crossing the first plane and a first plane mirror (FM1) perpendicular to the predetermined plane, and forming a first conjugate plane (C1) optically conjugate to a first area (R1) of the first plane; a second imaging system (G2) including a second concave mirror (CM2) having a second optical axis (AX2) parallel with the predetermined plane and a second plane mirror (FM2) perpendicular to the predetermined plane, and forming a second conjugate plane (C2) optically conjugate to a second area (R2) of the first plane; and a third imaging system (G3) making a third area (R3) of the second plane and the first conjugate plane optically conjugate to each other and making a fourth area (R4) of the second plane and the second conjugate plane optically conjugate to each other. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010002524(A) 申请公布日期 2010.01.07
申请号 JP20080159849 申请日期 2008.06.19
申请人 NIKON CORP 发明人 KUMAZAWA MASAHITO
分类号 G02B17/08;G02B13/18;G03F7/20;H01L21/027 主分类号 G02B17/08
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