| 摘要 |
The invention relates to a polyether block amide film, having both resistance to N,N-diethyl-3-methylbenzamide (DEET) insecticide according to MTL-DTL-31011B along with a high level of breathability (>700 g/m2/day) according to ASTM E96 B (50% R.H. & 23° C.). The polyether block polyamides of the invention can be applied to a substrate to produce water barrier, DEET-resistant and breathable apparel.
|
