THE PATTERNING METHOD OF BLOCKCOPOLYMER WITH NANOSTRUCTURE USING SOLVENT ANNEALING AND DEWETTING

摘要

PURPOSE: A method for patterning a nano structure of a block copolymer using solvent annealing and dewetting is provided to obtain a symmetry suitable for specific purpose by patterning a dewetting area largely. CONSTITUTION: A substrate is micro-patterned by stamping a substrate using the patterned micro-mold with a solution for a self assembly thin film. The block copolymer solution is spin-coated on the micro-patterned substrate. The spin-coated substrate is dewetted and annealed with solvent.