| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive film deposition method and an inexpensive film deposition apparatus which perform high-temperature anneal of a film or deposit a thermal CVD film on a surface of a substrate while maintaining the substrate at low temperature. Ž<P>SOLUTION: When a plurality of high-temperature gas beams 2b, 2c are blown in a substantially orthogonal direction onto a surface of a substrate 1 adhered to and supported on a supporting stand 4, only the surface of the substrate can be annealed. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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