发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FOR BARRIER RIB FORMATION AND BARRIER RIB
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition for barrier rib formation excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in developability, and barrier ribs. <P>SOLUTION: The barrier ribs are formed using the negative photosensitive resin composition for barrier rib formation comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a &le;20C alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is 5-25 mass%, and the proportion of the ink repellent (B) is 0.01-20 mass%, based on the total solid content of the negative photosensitive resin composition for barrier rib formation. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010002928(A) 申请公布日期 2010.01.07
申请号 JP20090231074 申请日期 2009.10.05
申请人 ASAHI GLASS CO LTD 发明人 TAKAHASHI HIDEYUKI;ISHIZEKI KENJI
分类号 G03F7/004;G02F1/1335;G03C1/492;G03F7/027;G03F7/033;G03F7/038;H01L51/50;H05B33/12;H05B33/22 主分类号 G03F7/004
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