发明名称 Electrolytic Tin Plating Solution and Electrolytic Tin Plating Method
摘要 A plating solution and a plating method, which does not use a complexing agent and which provides favorable solder wetting properties and an extremely low coupling rate when electrolytic tin plating is performed, and particularly when electrolytic tin plating is performed using a barrel plating method.
申请公布号 EP2141261(A2) 申请公布日期 2010.01.06
申请号 EP20090155197 申请日期 2009.03.16
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 IMANARI, MASAAKI;TING, FAI LUNG;SHIMAZU, MOTOYA;OHTA, YASUO
分类号 C25D3/30;C25D7/12;C25D17/16 主分类号 C25D3/30
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