发明名称 |
Film deposition apparatus, film deposition method, and computer readable storage medium |
摘要 |
<p>A disclosed film deposition apparatus includes a turntable having in one surface a substrate receiving portion along a turntable rotation direction; a first reaction gas supplying portion for supplying a first reaction gas; a second reaction gas supplying portion for supplying a second reaction gas; a separation area between a first process area where the first reaction gas is supplied and a second process area where the second reaction gas is supplied, the separation area including a separation gas supplying portion for supplying a first separation gas in the separation area, and a ceiling surface opposing the one surface to produce a thin space; a center area having an ejection hole for ejecting a second separation gas along the one surface; and an evacuation opening for evacuating the chamber
</p> |
申请公布号 |
EP2138604(A3) |
申请公布日期 |
2010.01.06 |
申请号 |
EP20090163736 |
申请日期 |
2009.06.25 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KATOH, HITOSHI;HONMA, MANABU;DIP, ANTHONY |
分类号 |
C23C16/458;C23C16/455 |
主分类号 |
C23C16/458 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|