| 摘要 |
PURPOSE: A vacuum process device is provided to reduce a non-operation time of the device by decreasing the maintenance and replacement processes. CONSTITUTION: A vacuum process device(100) includes an atmospheric block(101) and a vacuum block(102). The atmospheric block is positioned in front of the vacuum process device. The atmospheric block supplies a wafer to a process chamber. The vacuum block is positioned behind the vacuum process device. The vacuum block includes a process unit(103a,103b,104) with the process chamber to process the wafer, a transfer unit(105) for transferring the wafer to the process chamber, and a plurality of lock chambers for connecting the transfer unit and the atmospheric block. The atmospheric block transfers, receives, positions the wafer under the atmospheric pressure.
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