发明名称 CLUSTER FOR TREATMENTING SUBSTRATE
摘要 <p>PURPOSE: A cluster for treating a plurality of substrates is provided to improve productivity by processing a plurality of substrates in one process chamber. CONSTITUTION: In a device, a transfer chamber(114) limits a transfer space of a substrate under vacuum condition. A transfer chamber robot(124) transfers the substrate between a processing chamber(116) and a preheat chamber(120). The processing chamber is connected to the transfer chamber. The processing chamber process the substrate under the vacuum condition. A load lock chamber(112) is connected to the transfer chamber. A substrate transport apparatus(122) includes a plurality of first rollers and second rollers. A plurality of first rollers loads a plurality of substrates in a tray, and a plurality of second rollers transfers the tray to the load-lock chamber.</p>
申请公布号 KR20100001603(A) 申请公布日期 2010.01.06
申请号 KR20080061577 申请日期 2008.06.27
申请人 JUSUNG ENGINEERING CO., LTD. 发明人 SHIN, YONG WOO
分类号 H01L21/68;H01L21/677 主分类号 H01L21/68
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