FABRICATION METHOD FOR A SEMICONDUCTOR DEVICE,申请号KR20070138214-传众专利搜索

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发明名称	FABRICATION METHOD FOR A SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100935750(B1)	申请公布日期	2010.01.06
申请号	KR20070138214	申请日期	2007.12.27
申请人		发明人
分类号	H01L21/762;H01L21/76	主分类号	H01L21/762
代理机构		代理人
主权项
地址

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