| 摘要 |
The device (6) has attaching projections (4, 10) in form of an integral chamfer for attaching the device in a horizontal and/or vertical direction. The device is attached at a main beam (7) by pivoting or displacement. The device is detached from the main beam in a condition, in which a transverse carrier (8) lies on the main beam, and a lining skin is attached at the transverse carrier. The attaching projections are brought into engagement at flanges (12, 13) of the main beam. A penetrating projection (3) penetrates into material of the main beam in an attached condition of the device. An independent claim is also included for a method for constructing a ceiling formwork in a building industry. |
