EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR DEVICE ANALYZED LAYERED MEDIA DIMENSION AND USED THE SAME
摘要
PURPOSE: An equipment for manufacturing a semiconductor device analyzed layered media dimension and used the same are provided to calculate a complex three-dimensional pattern by obtaining a profile corresponding to a solution of a function. CONSTITUTION: A semiconductor substrate to be processed through a semiconductor manufacturing process(S10). A reference spectrum and reference profile from a substrate which is determined as a reference substrate is detected(S20). A function related to the function of the reference spectrum and reference profile is extracted(S30). A real-time spectrum of the fixed substrate is detected from the substrates. The profile of the substrate to be processed in a semiconductor manufacturing process is detected in real time by applying a real-time spectrum valuable to the function(S40).
申请公布号
KR20100000468(A)
申请公布日期
2010.01.06
申请号
KR20080059983
申请日期
2008.06.25
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
PARK, JANG IK;JUN, CHUNG SAM;PARK, HWANG SHIK;KIM, JI HYE;RYU, KWAN WOO;SA, KONG JUNG;YUN, SO YEON