| 摘要 |
PURPOSE: An inhibitor composition is provided to suppress metal etching while maintaining high polishing removal rate of a metal layer, and to reduce defects such as dishing and erosion. CONSTITUTION: An inhibitor composition used for chemical mechanical polishing comprises at least imidazoline compound or triazole compound, or combination thereof; and sarcosine and its salt compound or its combination. The sarcosine and its salt compound comprises sarcosine, lauroyl sarcosine, N-acyl sarcosine, cocoyl sarcosine, oleoyl sarcosine, stearoyl sarcosine, myristoyl sarcosine, or their lithium salt, sodium salt, potassium salt, amine salt, or their mixture.
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