发明名称 APPARATUS FOR MAKING ETCHING AREA ON SUBSTRATE
摘要 PURPOSE: An apparatus for making etching area on substrate is provided to consecutively process substrate corresponding to one task. CONSTITUTION: The worktable(2) comprises the internal space. The sealing part(4) is arranged in the lower part of the internal space of worktable. The sealing part adhesively installs substrate and stamp. The hard spots(6) are arranged in the upside of the sealing part. The hard spot solidifies the resin layer of substrate by examining the ultra violet (UV). The separate unit(8) is arranged in the upside of the hard spots. The separate unit separates the coadunate status of stamp and substrate. The transfer method(12) is separately placed with worktable. The transfer method transfers substrate or stamp to the sealing part or the hard spots, and the separate unit. The worktable comprises a plurality of internal spaces arranged as the multilayered state.
申请公布号 KR20100001849(A) 申请公布日期 2010.01.06
申请号 KR20080061926 申请日期 2008.06.27
申请人 DMS CO., LTD. 发明人 JUNG, CHANG HO;YANG, JAE YOUNG;YANG, CHUNG MO;LEE, JIN HYANG;KIM, DUCK SOO
分类号 H01L21/306;G02F1/13 主分类号 H01L21/306
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