发明名称 APPARATUS FOR CONTACTING MASK AND EXPOSURING APPARATUS HAVING THE SAME
摘要 <p>PURPOSE: An apparatus for contacting mask and exposing apparatus having the same are provided to adhere closely a mask to a mask completely by efficiently transferring a negative pressure to a gap between a mask and film. CONSTITUTION: In a device, a mask cover(50) includes a film(52) and a frame(51). The film is arranged on the mask(m). The Film is combined with the frame. A negative pressure generation unit forms a negative pressure in a gap between a film and a mask. The negative pressure generation unit is connected to an inlet(41) of a stage(40). The negative pressure transfer unit forms a passage to the space between the mask and the film from the inlet. The negative pressure transfer unit includes a material used for the passage, which is between the stage and film and is movable.</p>
申请公布号 KR20100001631(A) 申请公布日期 2010.01.06
申请号 KR20080061621 申请日期 2008.06.27
申请人 IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) 发明人 OH, JE HOON;LEE, DONG JUN;BAE, HAN SEUNG;KANG, BYUNG JU;HUH, JEUNG WOO
分类号 H01L21/027 主分类号 H01L21/027
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