| 发明名称 |
METHOD OF FORMING A DEPRESSION IN A SURFACE OF A LAYER OF PHOTORESIST |
| 摘要 |
A method of forming a depression in a surface of a layer of photo-resist comprises exposing a first portion of a layer of photo-resist with a first dose of radiant energy. A second portion of the layer is exposed with a second dose of radiant energy. The second dose is less than the first dose. The layer is baked. |
| 申请公布号 |
EP1700166(B1) |
申请公布日期 |
2010.01.06 |
| 申请号 |
EP20040812505 |
申请日期 |
2004.11.29 |
| 申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
SHAARAWI, MOHAMMED;STRAND, THOMAS R. |
| 分类号 |
G03F7/20;B01J2/14;B41J2/16;G03F7/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
