SUBSTRATE HEAT TREATMENT SYSTEM

摘要

PURPOSE: A substrate heat treatment system is provided to reduce a space and equipment by forming a chamber of a thermal treatment apparatus as a multi-layer structure without an additional transfer unit. CONSTITUTION: A heat treatment of substrate system comprises a thermal treatment unit(10) and a transfer unit(20). A thermal treatment unit includes at least one chamber(10a,10b,10c) with a heating unit(11a,11b,11c) for processing a substrate through thermal treatment. The transport unit is installed at the one side of the thermal treatment unit and supports the substrate before and after thermal treatment and transfers it. The chambers are deposited in a vertical direction, and the same process is performed in the chamber.